LithoTuner™ Pattern Matcher FullChip

Pattern Matcher FullChip brings complete optimization across all critical structures with exact scanner performance characterizations.

Complete Chip Analysis

Full chip analysis ensures that every critical structure is addressed in the matching optimization. Matching is no longer constrained to simple 1D through-pitch or limited pattern sets. Matching now finds and optimizes all sensitive patterns through the full process window. For the first time, matching optimization can cover the full chip over the entire process window, and with the exact variances of the actual scanners in the fab.

Full Scanner Characterization

Pattern Matcher FullChip identifies any structures sensitive to the actual scanner variations and includes them in the optimization. Each scanner's data is automatically obtained and used in the matching calculation. A range of internal adjustments including NA, Sigma, Stage tilt and Ellipticity is used to tune each scanner individually.

More LithoTuner Information:

Data Sheet (.pdf)
Press Release